RSG10000 RF Power Supply
- PRODUCT DETAIL
RSG10000 RF Power Supply
Product Introduction
The RSG10000 RF Power Supply is a solid-state radio-frequency power source designed for plasma processing equipment, including RF sputtering systems, plasma-enhanced chemical vapor deposition (PECVD) systems, and reactive ion etching equipment. It uses high-quality RF components from internationally recognized manufacturers to deliver stable output, reliable operation, and long service life.
Available in rated power configurations from 500 W to 10,000 W, the RSG10000 supports continuous power adjustment, optional pulse modulation, and adjustable phase shifting for dual-output configurations. Its air-cooled design and support for continuous operation make it suitable for research laboratories, semiconductor-related processes, and industrial plasma applications.
Performance Features
• Multiple Power Options: Rated output power configurations of 500 W, 1,000 W, 2,000 W, 5,000 W, and 10,000 W.
• Adjustable RF Output: Output power continuously adjustable from 5% to 100% of rated power.
• High Stability: Power stability of ≤ ±0.5% and frequency stability of ≤ ±0.005%.
• Fast Response: Rated-output startup response time of less than 10 ms.
• Flexible Signal Modes: Continuous-wave output, square-wave output, and additive pulse modulation.
• Adjustable Phase Shifting: Output phase adjustment from 0° to 180° for dual-output configurations.
• Low Harmonic Distortion: Second harmonic below −50 dB and third and higher harmonics below −55 dB.
• Industrial Reliability: Solid-state construction with forced-air cooling for continuous operation.
Working Principle
The RSG10000 uses semiconductor-based RF excitation circuitry to generate a standard sinusoidal RF signal at the specified operating frequency. Its power-control circuitry regulates the output to maintain stable RF delivery under suitable load-matching conditions.
Depending on the configuration, the generator can provide continuous-wave or modulated output. Pulse parameters and phase shifting can be adjusted to support different plasma-processing requirements. The 50 Ω output interface enables connection to compatible RF loads and plasma equipment.
Technical Parameters
|
Parameter |
Specification |
|
Rated Output Power |
500 W, 1,000 W, 2,000 W, 5,000 W, 10,000 W |
|
Output Power Adjustment |
5%–100%, continuously adjustable |
|
Single-Channel Power Rating |
Up to half of total rated power, according to the supplied specification |
|
Relative Power Deviation Between Two Outputs |
≤ 1%, with both outputs properly matched |
|
Power Stability |
≤ ±0.5% |
|
Frequency Stability |
≤ ±0.005% |
|
Maximum Output Power Margin |
Approximately 10% |
|
Rated-Output Startup Response Time |
< 10 ms |
|
RF Signal Waveform |
Standard sine wave |
|
Available Frequencies |
13.56 MHz, 27.12 MHz, 81.36 MHz, 100 MHz, and other custom frequencies |
|
Output Modes |
Continuous wave, square wave, pulse modulation |
|
Pulse Width |
10 μs to continuous-wave operation |
|
Duty Cycle |
User-defined |
|
Square-Wave Rise/Fall Time |
≤ 3 μs |
|
Phase Adjustment Range |
0°–180° for dual-output configurations |
|
Output Impedance |
50 Ω |
|
Maximum VSWR |
≤ 2.0 |
|
Second Harmonic |
< −50 dB |
|
Third and Higher Harmonics |
< −55 dB |
|
Output Noise |
< −50 dB |
|
Cooling Method |
Air cooling |
|
Supply Voltage |
AC 220 V ±15%, 50/60 Hz |
|
Operating Temperature |
0–40°C |
|
Relative Humidity |
< 85% |
|
Communication Interface |
15-pin D-type interface |
|
RF Output Connector |
Standard coaxial connector; N-type specified |
|
Core Components |
Imported semiconductor devices |
Application Scenarios
• RF Sputtering: Supplies RF power for thin-film deposition and material coating.
• PECVD Systems: Supports plasma-enhanced chemical vapor deposition processes.
• Reactive Ion Etching: Provides RF excitation for plasma etching equipment.
• Semiconductor and Materials Research: Supports plasma experiments and process development.
• University and Research Laboratories: Provides a controllable RF source for scientific research.
• Industrial Plasma Equipment: Integrates with compatible equipment requiring stable RF power and continuous operation.
RSG10000 RF Power Supply Comparison
|
Feature |
RSG10000 RF Power Supply |
Basic RF Power Supply |
|
Rated Power Options |
500 W–10,000 W configurations |
Depends on model |
|
Power Adjustment |
Continuous, 5%–100% |
Model-dependent |
|
Power Stability |
≤ ±0.5% |
Model-dependent |
|
Frequency Stability |
≤ ±0.005% |
Model-dependent |
|
Modulation |
Continuous wave, square wave, pulse modulation |
May be limited |
|
Phase Shifting |
0°–180° for applicable dual-output configurations |
Configuration-dependent |
|
Cooling |
Air cooling |
Model-dependent |
|
Typical Applications |
Sputtering, PECVD, plasma etching, research |
Depends on output and control features |
Frequently Asked Questions
1. What is the RSG10000 RF power supply used for?
It is designed to supply RF energy to plasma-processing equipment, including sputtering systems, PECVD systems, and reactive ion etching equipment.
2. What rated power options are available?
The listed configurations are 500 W, 1,000 W, 2,000 W, 5,000 W, and 10,000 W. Confirm the required power rating when ordering.
3. Which operating frequencies are supported?
The listed frequencies include 13.56 MHz, 27.12 MHz, 81.36 MHz, and 100 MHz, with other frequencies available by customization.
4. Can the output power be adjusted?
Yes. The output power is continuously adjustable from 5% to 100% of rated power.
5. Does the RF generator support pulse modulation?
Yes. The specification lists continuous-wave output, square-wave output, and additive pulse modulation, with pulse widths from 10 μs to continuous-wave operation.
6. How stable is the RF output?
The specified power stability is ≤ ±0.5%, while frequency stability is ≤ ±0.005%.
7. What are the power supply and cooling requirements?
The listed supply is AC 220 V ±15% at 50/60 Hz. The unit uses air cooling and has a specified operating temperature range of 0–40°C.
8. Can the RSG10000 operate continuously?
The manufacturer describes the solid-state design as suitable for 24-hour continuous operation. Actual service life depends on operating conditions, installation, maintenance, and the selected configuration.
9. Can the RF power supply be customized?
Custom operating frequencies are listed as available. Contact the manufacturer to confirm power ratings, output configuration, connector type, communication requirements, and pulse-control options for the intended system.
